Close
Biotechgate
| |

Home Page

Action required: Please refresh your browser

We have recently implemented some changes that require a hard refresh of your browser: Please hold down the CTRL-key and press the F5 key.
After a successful hard refresh, this message should not appear anymore.

More details about this topic are available here »

Global Chemical Vapor Deposition Market 2014-2018
By: PR Newswire Association LLC. - 24 Apr 2014Back to overview list

DUBLIN, Apr. 24, 2014 /PRNewswire/ --

Research and Markets

(

http://www.researchandmarkets.com/research/ss3gxc/global_chemical

) has announced the addition of the

"Global Chemical Vapor Deposition Market 2014-2018"

report to their offering.



http://photos.prnewswire.com/prnh/20130307/600769

The analysts forecast the Global Chemical Vapor Deposition market to grow at a CAGR of 11.43 percent over the period 2013-2018. One of the key factors contributing to this market growth is the increasing demand for CVD in the Semiconductor industry. The Global Chemical Vapor Deposition market has also been witnessing the increasing use of plasma-enhanced CVD. However, the high total cost of ownership could pose a challenge to the growth of this market.



The report, the Global Chemical Vapor Deposition Market 2014-2018, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the Americas, and the EMEA and APAC regions; it also covers the Global Chemical Vapor Deposition market landscape and its growth prospects in the coming years. The report also includes a discussion of the key vendors operating in this market.



Plasma-enhanced CVD is carried out in a vacuum system to generate plasma. The process is the only CVD technique to ensure deposition of a thin film coating at a low temperature. For instance, deposition of Si3N4 on integrated circuits needs to be carried out at a low temperature through plasma enhanced CVD. Thus, there has been an increased use of plasma-enhanced CVD in the market in 2013, although it is a more expensive technique than thermally activated CVD. This trend is expected to contribute significantly to the growth of the Global Chemical Vapor Deposition market during the forecast period.



According to the report, increasing demand for CVD among semiconductor manufacturers is one of the major drivers in the market, as CVD equipment and materials are used widely in the manufacturing of semiconductors.



Key Topics Covered:

01. Executive Summary

02. List of Abbreviations

03. Scope of the Report

04. Market Research Methodology

05. Introduction

06. Market Landscape

07. Market Segmentation by Technology

08. Market Segmentation by Product

09. Market Segmentation by End-users

10. Geographical Segmentation

11. Buying Criteria

12. Market Growth Drivers

13. Drivers and their Impact

14. Market Challenges

15. Impact of Drivers and Challenges

16. Market Trends

17. Trends and their Impact

18. Vendor Landscape

19. Key Vendor Analysis

20. Other Reports in this Series


Companies Mentioned:

  • Adeka Corp.
  • Applied Materials Inc.
  • ASM International N.V.
  • Kurt J. Lesker Co.


For more information visit http://www.researchandmarkets.com/research/ss3gxc/global_chemical


Media Contact:

Laura Wood , +353-1-481-1716, press@researchandmarkets.net


SOURCE Research and Markets

Related companies:RBC Capital Market | KeyBanc Capital Markets
Copyright 2014 PR Newswire Association LLC. Back to overview list
to the top ↑